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Measurement method for topographic parameters of high-aspect-ratio microstructures utilize microscopic interferometry
GB/T 48095-2026 高深宽比微结构形貌参数显微干涉测量方法
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This document describes the measurement principle, measuring device, measurement environment, samples, measurement procedure, data processing and measurement report of the microscopic interferometry method for measuring the topographic parameters of high-aspect-ratio microstructures. This document is applicable to the inspection and measurement of the topographic parameters of high-aspect-ratio microstructures with an aspect ratio of not more than 50 in micro/nano devices that are transparent to visible or near-infrared light.
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